Moody, M. J., Henning, A., Jurca, T., Shang, J. Y., Bergeron, H., Balla, I., . . . Lauhon, L. J. (2018). Atomic Layer Deposition of Molybdenum Oxides with Tunable Stoichiometry Enables Controllable Doping of MoS2. Chemistry of Materials, 30(11), 3628-3632. https://doi.org/10.1021/acs.chemmater.8b01171
Chicago-referens (17:e uppl.)Moody, Michael J., et al. "Atomic Layer Deposition of Molybdenum Oxides with Tunable Stoichiometry Enables Controllable Doping of MoS2." Chemistry of Materials 30, no. 11 (2018): 3628-3632. https://doi.org/10.1021/acs.chemmater.8b01171.
MLA-referens (9:e uppl.)Moody, Michael J., et al. "Atomic Layer Deposition of Molybdenum Oxides with Tunable Stoichiometry Enables Controllable Doping of MoS2." Chemistry of Materials, vol. 30, no. 11, 2018, pp. 3628-3632, https://doi.org/10.1021/acs.chemmater.8b01171.
