APA (7th ed.) Citation

Liu, W., Yue, X., & Lin, Z. (2024). Retraction of 'Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures'. ACS Omega, 9(10), 12291. https://doi.org/10.1021/acsomega.4c01652

Chicago Style (17th ed.) Citation

Liu, Wansuo, Xiangji Yue, and Zeng Lin. "Retraction of 'Effect of Fluoride Layer Growth on the Deposition Rate Under Different Microchannel Structures'." ACS Omega 9, no. 10 (2024): 12291. https://doi.org/10.1021/acsomega.4c01652.

MLA (9th ed.) Citation

Liu, Wansuo, et al. "Retraction of 'Effect of Fluoride Layer Growth on the Deposition Rate Under Different Microchannel Structures'." ACS Omega, vol. 9, no. 10, 2024, p. 12291, https://doi.org/10.1021/acsomega.4c01652.