Asamoto, Y., Urabe, K., Matsuda, T., Hamano, T., Noma, M., Yamashita, M., . . . Eriguchi, K. (2024). Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes. IEEE Transactions on Plasma Science, Plasma Science, IEEE Transactions on, IEEE Trans. Plasma Sci., 52(6), 2333. https://doi.org/10.1109/TPS.2024.3417896
Chicago-referens (17:e uppl.)Asamoto, Y., K. Urabe, T. Matsuda, T. Hamano, M. Noma, M. Yamashita, S. Hasegawa, och K. Eriguchi. "Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes." IEEE Transactions on Plasma Science, Plasma Science, IEEE Transactions on, IEEE Trans. Plasma Sci. 52, no. 6 (2024): 2333. https://doi.org/10.1109/TPS.2024.3417896.
MLA-referens (9:e uppl.)Asamoto, Y., et al. "Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes." IEEE Transactions on Plasma Science, Plasma Science, IEEE Transactions on, IEEE Trans. Plasma Sci., vol. 52, no. 6, 2024, p. 2333, https://doi.org/10.1109/TPS.2024.3417896.
