APA (7th ed.) Citation

Carnide, G., Simonnet, C., Parmar, D., Zavvou, Z., Klein, H., Conan, R., . . . Clergereaux, R. (2024). Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition. Plasma Chemistry and Plasma Processing, 44(3), 1343-1356. https://doi.org/10.1007/s11090-024-10455-x

Chicago Style (17th ed.) Citation

Carnide, G., et al. "Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition." Plasma Chemistry and Plasma Processing 44, no. 3 (2024): 1343-1356. https://doi.org/10.1007/s11090-024-10455-x.

MLA (9th ed.) Citation

Carnide, G., et al. "Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition." Plasma Chemistry and Plasma Processing, vol. 44, no. 3, 2024, pp. 1343-1356, https://doi.org/10.1007/s11090-024-10455-x.