Hao, P., Chuang, L., Maeda, K., Nozawa, J., Morito, H., Fujiwara, K., & Zheng, L. (2024). In situ observation and numerical analysis of temperature gradient effects on growth velocity during directional solidification of silicon. Journal of Materials Science, 59(39), 18446-18460. https://doi.org/10.1007/s10853-024-10277-4
Chicago Style (17th ed.) CitationHao, Peiyao, Lu-Chung Chuang, Kensaku Maeda, Jun Nozawa, Haruhiko Morito, Kozo Fujiwara, and Lili Zheng. "In Situ Observation and Numerical Analysis of Temperature Gradient Effects on Growth Velocity During Directional Solidification of Silicon." Journal of Materials Science 59, no. 39 (2024): 18446-18460. https://doi.org/10.1007/s10853-024-10277-4.
MLA (9th ed.) CitationHao, Peiyao, et al. "In Situ Observation and Numerical Analysis of Temperature Gradient Effects on Growth Velocity During Directional Solidification of Silicon." Journal of Materials Science, vol. 59, no. 39, 2024, pp. 18446-18460, https://doi.org/10.1007/s10853-024-10277-4.