Zhu, Z., Mamidala, K. R., Persson, A. E. O., Wernersson, L., Lund University, F. o. E., Lund University, F. o. E., . . . Lund University, F. o. E. (2025). Low-frequency noise in ferroelectric III-V vertical gate-all-around FETs. IEEE Electron Device Letters. https://doi.org/10.1109/LED.2025.3546165
Chicago Style (17th ed.) CitationZhu, Zhongyunshen, et al. "Low-frequency Noise in Ferroelectric III-V Vertical Gate-all-around FETs." IEEE Electron Device Letters 2025. https://doi.org/10.1109/LED.2025.3546165.
MLA (9th ed.) CitationZhu, Zhongyunshen, et al. "Low-frequency Noise in Ferroelectric III-V Vertical Gate-all-around FETs." IEEE Electron Device Letters, 2025, https://doi.org/10.1109/LED.2025.3546165.
Warning: These citations may not always be 100% accurate.