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Academic Journal

Inhibiting the imprint effect of the TiN/HZO/TiN ferroelectric capacitor by introducing a protective HfO2 layer

Shihao Yu, Yefan Zhang, Peng Yang, Xiaopeng Luo, Zhenyuan Sun, Haijun Liu, Sen Liu

AIP Advances, Vol 14, Iss 8, Pp 085012-085012-6 (2024)

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