Kim, H., Kim, Y., Ito, Y., & Sugita, N. (2025). Precise Three-Surface Interferometry for Thickness Separation in Blank Masks. International Journal of Precision Engineering and Manufacturing, 1-14. https://doi.org/10.1007/s12541-025-01263-0
Chicago-referens (17:e uppl.)Kim, Hwan, Yangjin Kim, Yusuke Ito, och Naohiko Sugita. "Precise Three-Surface Interferometry for Thickness Separation in Blank Masks." International Journal of Precision Engineering and Manufacturing 2025: 1-14. https://doi.org/10.1007/s12541-025-01263-0.
MLA-referens (9:e uppl.)Kim, Hwan, et al. "Precise Three-Surface Interferometry for Thickness Separation in Blank Masks." International Journal of Precision Engineering and Manufacturing, 2025, pp. 1-14, https://doi.org/10.1007/s12541-025-01263-0.
